发明专利
(1) 刘婷,张纪才。一种提高氮化镓基高电子迁移率晶体管的二维电子气浓度的方法,国家发明专利:ZL202211257406.9。
(2) 新田州吾,渡边浩崇,刘婷,天野浩.一种防止硅氧烷污染的氮化物半导体晶圆的封装方法(ウエハパッゲ - ジおよひその製造方法),JP2021014507。
(3) 张纪才,刘婷。高质量氮化铝模板及其制备方法和应用,国家发明专利:ZL202111497389.1。
(4) 张纪才,刘婷,王建峰,徐科。一种制备半极性AlN模板的方法,国家发明专利:201610137668.X。
代表性论文
(1) T. Liu, F. Chen, J. Li J, and C. Tong*. Frequency-domain thermoreflectance for micro-and nanoscale thermal metrology: principles, instrumentation, and reliable parameter extraction. Advanced Scientific Instruments, 2026: 100037.
(2) J. Ji, M. Sun, X. Li, Y. Lu, T. Liu*, and J. Zhang*, Defect Analysis by X-Ray Diffraction in Semipolar (11-22) AlN Grown by HVPE, Crystal Growth & Design, vol. 25, no. 20, 2025.
(3) J. Ji, T. Liu*, Z. He, C. Fang, X. Yan, M. Chen, Z. Shen, M. Sun, and J. Zhang*, Semipolar (11-22) AlN Films Grown by Hydride Vapor Phase Epitaxy for Schottky Barrier Diodes, Crystal Growth & Design, vol. 24, no. 9, pp. 3960–3966, 2024.
(4) T. Liu, H. Watanabe, S. Nitta, J. Wang, G. Yu, Y. Ando, Y. Honda, H. Amano, A. Tanaka*, and Y. Koide, Suppression of the Regrowth Interface Leakage Current in AlGaN/GaN HEMTs by Unactivated Mg Doped GaN Layer, Applied Physics Letters, vol. 118, no. 7, 2021.
(5) T. Liu, D. Li, H. Hu, X. Huang, Z. Zhao, W. Sha, C. Jiang, C. Du, M. Liu, X. Pu, B. Ma*, W. Hu*, and Z. L. Wang*, Piezo-Phototronic Effect in InGaN/GaN Semi-Floating Micro-Disk LED Arrays, Nano Energy, vol. 67, p. 104218, 2020.